Applied Physics Letters · 1987 · 68 citations · 16 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsSurface ScienceEpitaxial GrowthSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor InterfacesSemiconductor PhysicsSemiconductor SurfacesEpitaxial Film GrowthEpitaxial Growth MorphologyEpitaxial Thin-film GrowthMolecular Beam EpitaxySemiconductor Surface Preparation
The orientation of CdTe grown epitaxially onto clean (100) GaAs by molecular beam epitaxy can be predetermined by the GaAs precursor surface reconstruction that is present where the CdTe growth is initiated. A Ga-stabilized GaAs starting surface yields CdTe (111) and an As-stabilized GaAs surface yields CdTe (100).
16
Molecular beam epitaxy of Cd1−<i>x</i>Mn<i>x</i>Te
L. A. Kolodziejski, T. SAKAMOTO, R. L. Gunshor et al. · Applied Physics Letters · 1984 · 94 citations
Natural Sciences, Materials Engineering, Materials Science +17