Publication | Open Access
Structure of droplet-epitaxy-grown InAs/GaAs quantum dots
11
Citations
30
References
2011
Year
Materials ScienceSemiconductorsInas/gaas Dot SystemEngineeringCrystalline DefectsPhysicsOptoelectronic MaterialsApplied PhysicsQuantum MaterialsQuantum DotsGa DiffusionInterlayer SpacingSemiconductor MaterialMolecular Beam EpitaxyCompound SemiconductorSemiconductor Nanostructures
We have used a direct x-ray phasing method, coherent Bragg rod analysis, to obtain sub-angstrom resolution electron density maps of the InAs/GaAs dot system. The dots were grown by the droplet heteroepitaxy (DHE) technique and their structural and compositional properties are compared with those of dots grown by the strain-driven Stranski–Krastanov method. Our results show that the Ga diffusion into the DHE-grown dots is somewhat larger; however, other characteristics such as the composition of the dots’ uppermost layers, the interlayer spacing, and the bowing of the atomic layers are similar.
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