Applied Physics Express · 2013 · 13 citations · 21 references
EngineeringElectrical EngineeringMaterials ScienceOptoelectronicsSemiconductor DevicesSemiconductor MaterialsIii-v SemiconductorsLight-emitting DiodesSemiconductor Device MaterialsSemiconductor PhysicsWide-bandgap Semiconductor DevicesWide-bandgap SemiconductorsExternal Quantum EfficiencyGallium NitrideGallium Nitride (Gan) MaterialsGallium Nitride Light-emitting DiodesPower OutputQuantum EfficiencyStructural DegradationVertical Light-emitting Diodes
Layer transfer via ion-cut has been developed for GaN to fabricate multiple templates from a high-quality GaN wafer without compromising the crystallinity. Here, we report on the successful fabrication of 4-in. layer-transferred GaN on sapphire. A high quality epitaxial layer is also successfully grown despite the structural degradation in the transferred layer by hydrogen implantation. Fully packaged vertical light-emitting diodes grown on the template exhibit the peak external quantum efficiency of 48.6% and optical output power of 1.8 W at 220 A/cm2, suggesting that the template could serve as a low-cost substrate for high-performance nitride devices.
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Siddha Pimputkar, James S. Speck, Steven P. DenBaars et al. · Nature Photonics · 2009 · 2.2K citations
Engineering, Electrical Engineering, Materials Engineering +12
Silicon on insulator material technology
M. Bruel · Electronics Letters · 1995 · 1K citations
Surface activated bonding of silicon wafers at room temperature
Hideki Takagi, Kenya Kikuchi, Ryutaro Maeda et al. · Applied Physics Letters · 1996 · 441 citations