Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups

Abstract

Photolabile groups can be incorporated into metal-organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.