Publication | Closed Access
High-power etched-facet lasers
10
Citations
4
References
1987
Year
EngineeringLaser ScienceLaser ApplicationsLaser MaterialOptoelectronic DevicesHigh-power LasersLaser ControlIon ImplantationSemiconductor LasersPulse PowerPhotonicsElectrical EngineeringLaser DiodesLaser Processing TechnologyMicroelectronicsHigh-power Etched-facet LasersAdvanced Laser ProcessingAnetched FacetApplied PhysicsIon BeametchingOptoelectronics
We demonstrate, for the first time, laser diodes with anetched facet fabricated by chemically assisted ion beametching, producing 1–7 W pulsed and 470mW CW output power from one facet. The devices were coated and bonded junction-side-up and tested at room temperature. The single 40 μm stripe, 300 μm-long devices exhibit 94 mA threshold current and differential quantum efficiencies of 80% pulsed (78% CW).
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