Dynamical characterization of one-dimensional stationary growth regimes in diffusion-limited electrodeposition processes

Abstract

The occurrence of stationary growth regimes in thin gap electrodeposition experiments is discussed in terms of diffusion-limited dynamics and confirmed by a quantitative interferometric analysis of concentration fields during copper electrodeposition in 50-\ensuremath{\mu}m cells, with unsupported electrolytes. We develop a 1D model for the time evolution of the averaged concentration profile after Sand's time and we check its predictions during the transitory and asymptotic growth regimes in electrodeposition experiments.