Electrical conduction control of carbon nanowalls

Abstract

The electrical conduction behavior of carbon nanowalls (CNWs) has been evaluated by Hall measurement. CNWs, which comprise stacks of graphene sheets standing on the substrate, are fabricated by fluorocarbon/hydrogen plasma enhanced chemical vapor deposition. We have investigated the effect of N2 addition to C2F6∕H2 system on the electrical properties of CNWs. The CNWs grown with the C2F6∕H2 plasma exhibit p-type conduction. As a result of the nitrogen inclusion in the CNWs, the conduction type of the CNWs changes to n type. The carrier concentration is controllable by changing the flow rate of the additional N2 during the CNW growth process.