Publication | Closed Access
The effect of temperature on the structure of tantalum nitride (TaN) thin films deposited by DC plasma
11
Citations
8
References
2011
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsDc PlasmaThin FilmsChemical Vapor DepositionPlasma ProcessingThin Film ProcessingTantalum Nitride
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