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Effects of oxygen on the growth of vapor‐deposited aluminium films
22
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1986
Year
Materials ScienceMaterials EngineeringChemical EngineeringVapor‐deposited Aluminium FilmsEngineeringAluminium NitrideSurface ScienceApplied PhysicsMaterials CharacterizationVacuum ScienceThin Film Process TechnologyVacuum DeviceThin FilmsChemical DepositionChemical Vapor DepositionThin Film ProcessingAnodizingMaterials Interfaces
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation M. J. Verkerk, G. J. van der Kolk; Effects of oxygen on the growth of vapor‐deposited aluminium films. Journal of Vacuum Science & Technology A 1 November 1986; 4 (6): 3101–3105. https://doi.org/10.1116/1.573636 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology A Search Advanced Search |Citation Search