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Low threshold current density of InAs quantum dash laser on InP (100) through optimizing double cap technique
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Citations
11
References
2009
Year
Quantum PhotonicsOptical MaterialsEngineeringCurrent DensityLaser ApplicationsLaser MaterialOptoelectronic DevicesHigh-power LasersUniformity ImprovementStack Qdh StructureDouble Cap TechniqueMolecular Beam EpitaxyOptical PumpingPhotonicsQuantum SciencePhysicsQuantum DeviceRelativistic Laser-matter InteractionInas Quantum DashesApplied PhysicsInas QuantumQuantum Photonic DeviceOptoelectronics
We report on the uniformity improvement of InAs quantum dashes (QDHs) grown by molecular beam epitaxy on InP (100) through optimizing double cap technique. Broad-area lasers were fabricated with an emission wavelength of 1.58 μm. A threshold current density of 360 A/cm2 was achieved for a five stack QDH structure and a cavity length of 1.2 mm. This results from a reduced inhomogeneous broadening (62 meV) and lower internal optical losses (7 cm−1). The achievement paves the way toward ultralow threshold semiconductor laser for telecommunications.
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