Publication | Open Access
Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C
54
Citations
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References
2013
Year
Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied PhysicsMagnetron SputteringTi–c–si Multilayer DepositionThin Film Process TechnologyThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing
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