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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

Materials ScienceMaterials EngineeringElectrical EngineeringMagnetismEngineeringApplied PhysicsCrn FilmsSubstrate Bias VoltageMagnetic MediumMicroelectronicsThin Film ProcessingMicrostructureMedium Frequency Magnetron