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(hfac)Cu(I)(MP) (hfac=hexafluoroacetylacetonate, MP=4-methyl-1-pentene) and (hfac)Cu(I)(DMB) (DMB=3,3-dimethyl-1-butene) for the chemical vapor deposition of copper film
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Citations
5
References
1999
Year
Materials ScienceChemical EngineeringCopper Oxide MaterialsEngineeringCopper FilmSurface ScienceChemistryChemical DepositionChemical Vapor DepositionThin Film Processing
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