Fabrication of multipassband moiré resonators in fibers by the dual-phase-mask exposure method

Abstract

We report on the fabrication of in-fiber moiré filters by dual exposure of a nondedicated chirped phase mask. This simple technique produces broadband filters whose structure depends only on an intermediate stretch between two identical UV exposures. We demonstrate moiré filters with as many as four narrow passbands within a 2-nm stopband.