Electron Beam Projection Nanopatterning Using Crystal Lattice Images Obtained from High Resolution Transmission Electron Microscopy

Abstract

An electron beam projection lithography technique that employs the various crystalline lattice images available in high-resolution transmission electron microscopy is reported. We successfully fabricated periodic arrays of various patterned structures with feature sizes of about 25 nm using single-crystalline Si and β-Si3N4 as the mask materials.