Publication | Closed Access
Semiconductor layer thickness impact on optical and resistive switching behavior of pulsed laser deposited BaTiO3/ZnO heterostructures
45
Citations
19
References
2013
Year
Optical MaterialsEngineeringOptoelectronic DevicesBatio3/zno HeterostructuresSemiconductor NanostructuresSemiconductorsZno Layer ThicknessZno ThicknessInterface PolarizationPulsed Laser DepositionCompound SemiconductorNanophotonicsMaterials ScienceOxide HeterostructuresOxide ElectronicsOptoelectronic MaterialsSemiconductor MaterialApplied PhysicsMultilayer HeterostructuresOptoelectronics
This work reports the impact of ZnO layer thickness on optical and resistive switching behavior of BaTiO3/ZnO heterostructures grown by pulsed laser deposition. The interface polarization coupling becomes more efficient and causes a remarkable change in heterostructure properties with decrease in ZnO layer thickness. The heterostructure with ZnO thickness of 25 nm displays the enhanced resistive switching characteristics with switching ratio ≈106 and good stability in low and high resistance states. Moreover, the photoluminescence spectrum exhibits two additional blue emissions when ZnO thickness is ≤50 nm and their mechanism is highlighted based on interface band offset and interface polarization coupling effect.
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