Applied Physics Letters · 2013 · 46 citations · 19 references
EngineeringMaterials EngineeringMaterials ScienceOptical MaterialsOptoelectronicsSemiconductor MaterialsOptical Properties Of SemiconductorsOptical Thin FilmsOptoelectronic DevicesOptoelectronic MaterialsOxide SemiconductorsSemiconductor HeterostructuresHeterostructure DevicesLayer Thickness EffectsPhotoluminescencePhotoluminescence SpectroscopyPolarizationPulsed Laser DepositionSemiconductor Oxide Thin FilmsZinc Oxides
This work reports the impact of ZnO layer thickness on optical and resistive switching behavior of BaTiO3/ZnO heterostructures grown by pulsed laser deposition. The interface polarization coupling becomes more efficient and causes a remarkable change in heterostructure properties with decrease in ZnO layer thickness. The heterostructure with ZnO thickness of 25 nm displays the enhanced resistive switching characteristics with switching ratio ≈106 and good stability in low and high resistance states. Moreover, the photoluminescence spectrum exhibits two additional blue emissions when ZnO thickness is ≤50 nm and their mechanism is highlighted based on interface band offset and interface polarization coupling effect.
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Memristive switching mechanism for metal/oxide/metal nanodevices
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Emissive ZnO–graphene quantum dots for white-light-emitting diodes
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