Publication | Closed Access
Fermi level shifting of TiO2 nanostructures during dense electronic excitation
38
Citations
22
References
2011
Year
EngineeringSemiconductor NanostructuresCpd ValuesIon ImplantationNanoscale ModelingNanoscale ScienceMaterials ScienceMaterials EngineeringPhysicsNanotechnologyOxide ElectronicsDefect FormationKelvin Probe MicroscopySolid-state PhysicNuclear CeramicSurface ScienceApplied PhysicsCondensed Matter PhysicsContact Potential DifferenceFermi Level Shifting
Scanning Kelvin probe microscopy has been used to understand the modification of work function of TiO2 with swift heavy ion irradiation. The observed increase in contact potential difference (CPD) indicates a shift in Fermi level towards the valence band, which is due to the development of defects during the bombardment of high energy heavy ions. The change in CPD values on ion irradiation is attributed to electronic excitation induced defect concentration and surface roughness.
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