An XPS Study of Blackening of Indium-Tin Oxide Film during Deposition of Dielectric Films by RF Magnetron Sputtering

Abstract

The blackening phenomenon of an indium-tin oxide (ITO) film when Sr(Zr 0.2 Ti 0.8 )O 3 dielectric film was deposited on it by the rf magnetron sputtering method has been examined by X-ray photoelectron spectroscopy. It was found that the blackening took place in the thin surface layer of the ITO film near the Sr(Zr 0.2 Ti 0.8 )O 3 /ITO interface and originated from preferential reduction of the Sn 4+ ion to Sn 0 rather than of In 3+ .