Publication | Closed Access
Origin of the Linear and Nonlinear Piezoresistance Effects in p-Type Silicon
49
Citations
10
References
1984
Year
Stress DecouplingEngineeringSilicon On InsulatorNonlinear Piezoresistance EffectsNanoelectronicsPiezoelectric MaterialCharge Carrier TransportP-type SiliconAnisotropic MaterialMaterials ScienceMaterials EngineeringElectrical EngineeringPhysicsSemiconductor MaterialSemiconductor Device FabricationPiezoelectricityTransverse PiezoresistanceMicroelectronicsApplied PhysicsP -Type SiliconOptoelectronics
Origin of the longitudinal and transverse piezoresistance of p -type silicon diffused layers as measured and analyzed by Yamada, Nishihara, Shimada, Tanabe, Shimazoe and Matsuoka is explored theoretically. A model of stress decoupling of the degenerate valence band into two bands of prolate and oblate ellipsoidal energy surface is shown to explain the qualitative feature of anisotropy, temperature dependence and the order of magnitude of the linear coefficients. On this basis, a further comparison is proposed between the model and the nonlinearity for conductivity, so as to establish the origin.
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