Focusing of hard x-rays to 16 nanometers with a multilayer Laue lens

Abstract

We report improved results for hard x-ray focusing using a multilayer Laue lens (MLL). We have measured a line focus of 16nm width with an efficiency of 31% at a wavelength λ=0.064nm (19.5keV) using a partial MLL structure with an outermost zone width of 5nm. The results are in good agreement with the theoretically predicted performance.