Temperature dependence of electrical properties for MOS capacitor with HfO2/SiO2 gate dielectric stack - Concepedia

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Temperature dependence of electrical properties for MOS capacitor with HfO2/SiO2 gate dielectric stack

30

Citations

17

References

2012

Year

Tao Yu, Chenggang Jin, Yaojun Dong, Danfeng Cao, Lanjian Zhuge, Xiaojun Wu

Materials Science in Semiconductor Processing

Electrical EngineeringMos CapacitorEngineeringBias Temperature InstabilityApplied PhysicsTemperature DependenceSilicon On InsulatorMicroelectronicsElectrical PropertiesSemiconductor Device

References

	Year	Citations

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