Novel Hybrid Organic–Inorganic Spin‐on Resist for Electron‐ or Photon‐Based Nanolithography with Outstanding Resistance to Dry Etching

Abstract

A new spin-on alumina-based resist exhibits excellent performance in terms of both achievable lateral resolution and etch resistance in fluorine-based non-cryo-cooled dry etching processes. The resist has selectivity greater than 100:1 with respect to the underlying silicon during the etching process, patternability with various lithographic tools (UV, X-rays, electron beam, and nanoimprint lithography), and positive and negative tone behavior depending only on the developer chemistry.