Publication | Closed Access
Low-temperature process for the preparation of high <i>T</i> <i>c</i> superconducting thin films
134
Citations
15
References
1987
Year
Superconducting MaterialEngineeringBismuth-based SuperconductorsThin Film Process TechnologySuperconductivityHigh Tc SuperconductorsSuperconducting DevicesThin Film ProcessingLow-temperature SuperconductivityMaterials ScienceHigh-tc SuperconductivityPhysicsLow-temperature ProcessHigh Temperature MaterialsHigh-temperature SuperconductivityHigh TcApplied PhysicsCondensed Matter PhysicsRf Magnetron SputteringThin FilmsQuantum Superconductivity
We have established the low-temperature process for the preparation of high Tc superconducting films by rf magnetron sputtering. The films were deposited at a temperature (650 °C) lower than the tetragonal-orthorhombic transition point with sufficient crystallizing and oxidizing conditions. The as-deposited Er-Ba-Cu-O film on MgO exhibited a sharp superconductive transition with zero resistance at 86 K. This process prevented diffusion at the film and substrate interface and reduced the porous structure in the films.
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