Publication | Closed Access
Photoresist-free lithography of 3μm wide UO3 lines from amorphous films of uranyl complexes
10
Citations
19
References
1994
Year
Materials ScienceEngineeringElectron-beam LithographyBeam LithographySurface ScienceApplied PhysicsWide Uo3 LinesUranyl ComplexesChemistryPhotopolymer NetworkPhotochromismPhotoresist-free LithographyNanolithography Method
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