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The Activation Energy of Phosphorus Donors in Silicon‐Rich Silicon–Germanium Alloys
14
Citations
9
References
1983
Year
EngineeringX Ge XGermanium ContentChemistrySilicon On InsulatorSemiconductorsIon ImplantationPhosphorenePhosphorus DonorsMaterials EngineeringMaterials SciencePhysicsIntrinsic ImpurityAtomic PhysicsSemiconductor MaterialQuantum ChemistryNatural SciencesApplied PhysicsActivation Energy
Abstract The activation energy of phosphorus substituted into Si 1− x Ge x alloys (0 ≦ x ≦ 0.27) is investigated by IR absorption. A weak shift of the activation energy with germanium content is found: E (A 1 ) = (45.5 − 26 x ) meV. This can be explained by multivalley effective mass theory with a phenomenological central cell potential which does not depend on alloy composition within the investigated range. The experiments show that P atoms are distributed at random in the alloy and that their positions are uncorrelated to those of the Ge atoms.
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