Applied Physics Letters · 1999 · 530 citations · 24 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsOptoelectronicsThin FilmsLuminescent MaterialsOptical Thin FilmsOptoelectronic MaterialsOxide SemiconductorsThin Film Optical PropertiesThin Film OxidationEmission Spectra AnalysisFull Width At Half MaximumIntensity ThresholdMetallic Thin FilmsNanostructured Optoelectronic MaterialsPolycrystalline Thin FilmsThin-film Optoelectronic MaterialsZinc Oxides
We report a simple method for preparing polycrystalline ZnO thin films with good luminescent properties: the oxidization of metallic Zn films. In photoluminescence (PL) studies at room temperature for wavelengths between 370 and 675 nm, we have observed a single exciton peak around 390 nm without any deep-level emission and a small PL full width at half maximum (23 meV), indicating that the concentrations of the defects responsible for the deep-level emissions are negligible. We have also observed optically pumped lasing action in these films. The threshold intensity for lasing was ∼9 MW/cm2.
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