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Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn
529
Citations
24
References
1999
Year
Materials ScienceIi-vi SemiconductorOptical MaterialsEngineeringPhotoluminescenceOptical PropertiesOxide ElectronicsApplied PhysicsLuminescence PropertySingle Exciton PeakGood Luminescent PropertiesThin FilmsPulsed Laser DepositionUltraviolet LasingMetallic Zn FilmsOptoelectronicsMetallic Zn
We report a simple method for preparing polycrystalline ZnO thin films with good luminescent properties: the oxidization of metallic Zn films. In photoluminescence (PL) studies at room temperature for wavelengths between 370 and 675 nm, we have observed a single exciton peak around 390 nm without any deep-level emission and a small PL full width at half maximum (23 meV), indicating that the concentrations of the defects responsible for the deep-level emissions are negligible. We have also observed optically pumped lasing action in these films. The threshold intensity for lasing was ∼9 MW/cm2.
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