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Surface-emitting stimulated emission in high-quality ZnO thin films
34
Citations
13
References
2004
Year
Optical MaterialsEngineeringSurface-emitting Stimulated EmissionThin Film Process TechnologyIi-vi SemiconductorZno Thickness DependenceStimulated EmissionOptical PropertiesMolecular Beam EpitaxyPulsed Laser DepositionThin Film ProcessingMaterials SciencePhotoluminescencePhysicsOxide ElectronicsApplied PhysicsReflectance SpectrumThin FilmsOptoelectronics
High-quality ZnO thin films were grown by plasma-enhanced molecular-beam epitaxy on sapphire substrates. Three excitonic transitions associated with the valence bands A, B, and C were clearly revealed in the reflectance spectrum measured at 33K. This result indicates that the ZnO thin films have the wurtzite crystalline structure. The emission spectra were measured with backscattering geometry at room temperature. When the excitation exceeded a certain value, linewidth narrowing, nonlinear rise of emission intensity, and the shortening of the carrier lifetime were clearly observed and these demonstrate the onset of stimulated emission. Together with the ZnO thickness dependence, we conclude that the observation of a stimulated emission in a direction perpendicular to the film surface is predominantly due to scattering of the in-plane stimulated emission by slightly remaining surface undulations in the ZnO films.
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