Japanese Journal of Applied Physics · 1988 · 164 citations · 9 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsEpitaxial GrowthEtching ProcessesSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor Thin FilmsThin Film EtchingEpitaxial Film GrowthEpitaxial Growth KineticsEpitaxial Lateral OvergrowthEpitaxial MaterialsEpitaxial Thin-film GrowthGrowth VelocityHeteroepitaxyPit Density
Epitaxial lateral overgrowth (ELO) of GaAs on SiO 2 film was successfully performed by LPE. It was found that the lateral overgrowth on (111)B substrate was the slowest when the stripe opening in SiO 2 film oriented in the <1̄10 > and equivalent directions, while it was the fastest when the stripe oriented in the <112̄ > and equivalent directions. In the latter case, a large lateral to vertical growth velocity ratio (up to 50) of epitaxial GaAs was achieved. RC etching revealed that the etch pit density in the lateral epitaxial GaAs was found to be extremely low.
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