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Photoluminescence and <i>p</i>-type conductivity in CdTe:N grown by molecular beam epitaxy
43
Citations
17
References
1994
Year
Materials ScienceSemiconductorsElectrical EngineeringIi-vi SemiconductorEngineeringElectronic MaterialsPhotoluminescenceNanoelectronicsUndoped Cdte LayersApplied PhysicsP-type ConductivitySemiconductor MaterialRf NitrogenMolecular Beam EpitaxyCharge Carrier TransportOptoelectronicsCompound Semiconductor
An rf nitrogen (N) plasma source has been used to achieve p-type conductivity in molecular beam epitaxy CdTe layers grown with a Cd overpressure. Photoluminescence and secondary ion mass spectrometry measurements have confirmed the incorporation of the N species, and evidence for the resulting p-type conductivity has been obtained using capacitance-voltage and current-voltage techniques. Net hole concentrations as high as 2×1017 cm−3 have so far been achieved, which contrasts with the normally n-type nature of our undoped CdTe layers.
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