Journal of Applied Physics · 1994 · 43 citations · 17 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor DevicesSemiconductor MaterialsCarrier TransportDopingOptical Properties Of SemiconductorsSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor PhysicsConductivityMolecular Beam EpitaxyN-type ConductivityOverpressureP-type ConductivityP-type DopingSecondary Ion Mass SpectrometrySemiconductor Conductivity
An rf nitrogen (N) plasma source has been used to achieve p-type conductivity in molecular beam epitaxy CdTe layers grown with a Cd overpressure. Photoluminescence and secondary ion mass spectrometry measurements have confirmed the incorporation of the N species, and evidence for the resulting p-type conductivity has been obtained using capacitance-voltage and current-voltage techniques. Net hole concentrations as high as 2×1017 cm−3 have so far been achieved, which contrasts with the normally n-type nature of our undoped CdTe layers.
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Acceptor states in CdTe and comparison with ZnTe. General trends
E. Molva, J.L. Pautrat, K. Saminadayar et al. · Physical review. B, Condensed matter · 1984 · 222 citations