Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition - Concepedia

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Properties of SiO2-like barrier layers on polyethersulfone substrates by low-temperature plasma-enhanced chemical vapor deposition

88

Citations

13

References

2004

Year

Dong‐Sing Wuu, W.C. Lo, L.-S. Chang, Ray‐Hua Horng

Thin Solid Films

Materials ScienceChemical EngineeringEngineeringNanotechnologySurface ScienceApplied PhysicsPolyethersulfone SubstratesChemical DepositionSilicon On InsulatorChemical Vapor DepositionThin Film ProcessingSio2-like Barrier Layers

References

	Year	Citations

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