RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition - Concepedia

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RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition

27

Citations

36

References

2013

Year

Suresh M. Chopade, S.A. Barve, K.H. Thulasi Raman, Navin Chand, M.N. Deo, A. Biswas, Sanjay Rai, G. S. Lodha, G.M. Rao, D.S. Patil

Applied Surface Science

Materials ScienceRf Self-biasElectrical EngineeringEngineeringOxide ElectronicsSurface ScienceApplied PhysicsThin FilmsPulsed Laser DepositionRf Plasma MocvdChemical Vapor DepositionThin Film ProcessingY2o3 Thin Films

References

	Year	Citations

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