Ion Etching of Fused Silica Glasses for High-Power Lasers

Tomosumi Kamimura, Yusuke Mori, Takatomo Sasaki, Hidetsugu Yoshida, Takayuki Okamoto, Kunio Yoshida

Japanese Journal of Applied Physics · 1998 · 19 citations · 3 references

Concepts

Abstract

Subsurface damage incurred during optical polishing, which is known to lower the laser damage thresholds of fused silica surfaces, was studied. Ceria in subsurface fissures was completely removed (depths up to one thousand Å) using rf-magnetron sputtering without degrading surface roughness. The laser-induced damage threshold of the optical coating deposited on an ion-etched surface was improved by a factor of two compared to that on an unprocessed surface.

References

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