Japanese Journal of Applied Physics · 1993 · 68 citations · 8 references
Natural SciencesMaterials SciencePhysicsMicroelectronicsSemiconductor MaterialsThin FilmsCrystalline MaterialsSemiconductor PhysicsSemiconductor Thin FilmsSilicon MaterialsThin Film Electrical PropertiesThin-film TransistorsConductionCrystal Lattice ScatteringCrystalline SiliconCrystallization In Thin FilmsElectronic ConductionSilicon Thin FilmsSingle-crystal SiliconTemperature Dependence
Uniformity of thin film transistor (TFT) characteristics was evaluated by varying the channel size. As channel length decreased and width fell below 1 µm, uniformity was degraded drastically. A few samples showed high-performance characteristics such as sharp gate voltage swing below 100 mV/dec and high mobility as high as 100 cm 2 /V·s near room temperature. Upon evaluation of their temperature dependence, the conduction mechanism showed not polycrystalline but single-crystal-like properties in the lattice scattering. The improved TFTs are thought to have been formed in grain boundary-free crystal grains.
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