Electrodeposition of Amorphous Selenium

Abstract

Amorphous selenium coatings have been electroplated in thicknesses up to 30 µ (1.2 mils) on bright nickel cathodes (and thicker coatings can be prepared). Data are given for studies leading to the selection of the optimum bath and operating conditions for the formation of reproducible, uniform, and adherent deposits. It is shown that the plating baths employed and the amorphous deposits obtained are extremely sensitive to a variety of conditions, thus emphasizing the need for further study of the electrodeposition of selenium in the amorphous form.