Properties of Crn and (Ti, Al)N Coatings Produced by High Rate Sputter Deposition

Abstract

CrNand (Ti, Al) N coatings have been deposited by high rate sputter deposition. CrN is one of the most uncritical coatings to produce, neither microhardness nor sputtering stability being influenced by sputtering conditions. Depending upon the nitrogen partial pressure during deposition and the aluminium content, (Ti, Al) N coatings with maximum microhardness values of 2200–3000 HV0.01 can be obtained. Such coatings have superior oxidation and wear resistance compared to normal sputtered TiN coatings.