InP/GaAsSb/InP and InP/GaAsSb/InGaAsP double heterojunction bipolar transistors with a carbon-doped base grown by organometallic chemical vapor deposition

R. Bhat, W-P. Hong, C. Caneau, M.A. Koza, C. Nguyen, Subrata Goswami

Applied Physics Letters · 1996 · 61 citations · 0 references

Concepts

Abstract

InP/GaAsSb double heterojunction bipolar transistors (DHBTs) may be an attractive alternative to InP/InGaAs DHBTs, since estimates of the band alignment indicate that it is ideal for fabricating n-p-n DHBTs. We have demonstrated the first organometallic chemical vapor deposition grown InP/GaAsSb DHBTs, with carbon-doped bases having an ft and fmax of 30 and 45 GHz, respectively.