Publication | Closed Access
Investigations on SiO 2 /HfO 2 mixtures for nanosecond and femtosecond pulses
36
Citations
0
References
2010
Year
Optical MaterialsEngineeringLaser ApplicationsSilicon On InsulatorLaser OpticsOptical DiagnosticsOptical PropertiesOxide MixturesPulse PowerPulsed Laser DepositionMaterials ScienceSio 2PhysicsDamage TestingLaser Processing TechnologyFemtosecond PulsesAdvanced Laser ProcessingLaser-induced BreakdownPulse ExposureSurface ScienceApplied PhysicsLaser-surface InteractionsLaser Damage
After several investigations in laser induced damage behavior of oxide mixtures of different compositions, also HfO<sub>2</sub> could be steplessly mixed with SiO<sub>2</sub>. A study of SiO<sub>2</sub>/HfO<sub>2</sub> IBS single layers and high reflectors is presented. Damage testing has been performed at 800nm and 355nm on an extensive set of single layers employing different mixture ratios of silica and hafnia. The analysis of the response of optical single layer coatings to femtosecond and nanosecond pulse exposure provides input for further coating designs, in particular for the optimization in respect to the damage threshold properties. A deeper understanding of the damage mechanisms is gained by comparing the ns and fs pulse results as a function of the mixing ratio.