An apparatus for studying sputter deposition with x rays

Abstract

While electron-based structural probes have been extensively applied to low-pressure film growth techniques such as evaporation, similar studies on sputter deposition have been hindered by the relatively high gas pressure (1–10 mT) inherent to the technique. Because x rays scatter more weakly than electrons the absorption in the ambient is not significant and diffraction from the growing film can be observed if a sufficiently bright source of x rays is used. We have developed a chamber which combines features of an ultrahigh-vacuum sputter-deposition system with the goniometric adjustments and the x-ray windows of a scattering chamber. A description of its design and recent results are presented.