Athermal crystallization induced by electronic excitations in ion-irradiated silicon carbide

Abstract

Silicon carbide single crystals were irradiated at room temperature with low energy I ions and high energy Pb ions. It is found that the damaged layer formed by the elastic collisions generated during low energy I ion irradiation can readily be removed by the electronic excitations induced by swift Pb ions. This effect occurs at a temperature quite below that at which the conventional ion-beam induced crystallization process is generally achieved by nuclear energy loss. This finding is interesting both from a fundamental point of view for the understanding of the interaction of swift heavy ions with solids and for a large number of technological applications.