Physical and Microstructural Properties of NiO‐ and Ni‐YSZ Composite Thin Films Fabricated by Pulsed‐Laser Deposition at <i>T</i> ≤700°C

Abstract

The physical and microstructural properties of NiO‐ and Ni‐YSZ composite thin films deposited by pulsed‐laser deposition have been investigated for nanoporous anode electrodes of SOFC applications. An NiO‐YSZ thin film which was deposited at room temperature and postannealed at 700°C exhibited a fine porous structure, but electrical conduction was not detected when reduced. On the other hand, 700°C‐deposited NiO‐YSZ films showed appropriate crystallinity and exhibited electrical conductivity after reduction; however, massive Ni agglomeration occurred and porous structures were not obtained as intended. It was shown that as the Ni content and the reduction temperature increase, the coarsening becomes much more severe.