Deposition of Barium Titanate Films on Silicon by Barium Fluotitanate Powder

Abstract

In this study, the barium fluotitanate powder prepared by the precipitate of hexafluorotitanic acid and barium nitrate solution was used as the precursor for the deposition of barium titanate film on silicon substrate. The boric acid was incorporated into the deposition solution to enhance the deposition rate. A mirrorlike film can be obtained. The chemical reaction of liquid-phase deposited barium titanate is proposed. The leakage current density is as low as 5 × 10-9 A/cm2. The dielectric constant and the refractive index of the deposited film are 60 and 1.96, respectively.