Chemical cleaning of metal surfaces in vacuum systems by exposure to reactive gases

Abstract

Chemical surface cleaning procedures for metals using oxidation/reduction cycles by exposure to oxidizing (O2, NO) and reducing (H2, NH3 ) gases are summarized and an update of the original compilation for chemical cleaning procedures published by Musket et al. [Appl. Surf. Sci. 10, 143 (1982)] is given. Examples discussed in this paper are cleaning procedures for iron, nickel, palladium, copper, and silver surfaces. We also present data on the reduction of gaseous contaminants in a stainless-steel UHV system by flowing nitric oxide through the system during bakeout.