Electrodeposition of Lead at Boron‐Doped Diamond Film Electrodes: Effect of Temperature

Abstract

Abstract The electrodeposition of lead on boron‐doped diamond has been studied with a view to identifying the fundamental parameters controlling the sensitivity and lower detection limit in anodic stripping voltammetry. Chronoamperometric transients are used to explore the deposition, indicating a progressive growth mechanism confirmed by ex situ AFM images. Linear sweep ASV experiments show a threshold concentration of ca 10 −6 M below which no lead is detected; this is attributed to the need for nucleation of the solid phase on the electrode. Experiments with variable temperature show that this threshold can be usefully lowered at elevated temperatures.