Publication | Closed Access
High-Detectivity GaN MSM Photodetectors with Low-Temperature GaN Cap Layers and Ir∕Pt Contact Electrodes
10
Citations
23
References
2007
Year
Wide-bandgap SemiconductorElectrical EngineeringGan Cap LayerUv PhotodetectorsEngineeringApplied PhysicsIr∕pt Contact ElectrodesAluminum Gallium NitrideGan Power DevicePhotoelectric MeasurementCategoryiii-v SemiconductorOptoelectronicsContact Electrodes
GaN-based metal-semiconductor-metal (MSM) UV photodetectors (PDs) with a low-temperature (LT) GaN cap layer and contact electrodes were fabricated. Compared with the conventional contacts, we found that contacts can reduce the dark current. Further, a smaller dark current and larger UV-to-visible rejection ratio obtained from the PD with LT GaN cap layer and contact electrodes were determined. Furthermore, the noise equivalent power and detectivity were respectively obtained as and for the aforementioned PDs.
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