Publication | Open Access
Annealing kinetics of electron-irradiated GaAs heteroface solar cells in the range 175–200 °C
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Citations
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1979
Year
SemiconductorsMaterials ScienceElectrical EngineeringIi-vi SemiconductorRange 175–200EngineeringCrystalline DefectsSemiconductor TechnologyApplied PhysicsGaas Solar CellsSemiconductor NanostructuresIrradiation DamageSemiconductor MaterialOptoelectronic DevicesElectron-irradiation DamageCompound SemiconductorPhotovoltaicsSolar Cell Materials
Annealing of electron-irradiation damage in GaAs solar cells is important for space applications. This paper describes studies conducted to understand this annealing process. GaAs heteroface solar cells were irradiated with 1×1015 1-MeV electrons/cm2 followed by thermal annealing. An activation energy for annealing of 1.25±0.14 eV and a frequency factor of (3.7±1.9) ×109 sec−1 were determined. A small component of the irradiation damage, which does not anneal measurably at 200 °C, was observed.
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