Publication | Closed Access

Role of ammonia and carbonates in scavenging hydroxyl radicals generated during megasonic irradiation of wafer cleaning solutions

Advanced Oxidation ProcessChemical EngineeringMegasonic IrradiationSonoelectrochemistrySonochemistryWater TreatmentWafer Cleaning SolutionsChemistryAmmoniaRadiation ChemistryHydroxyl RadicalsMineral Processing