Publication | Closed Access
Low resistance high reflectance contacts to p-GaN using oxidized Ni/Au and Al or Ag
122
Citations
6
References
2003
Year
Wide-bandgap SemiconductorAluminium NitrideOptical MaterialsEngineeringOptoelectronic DevicesElectronic DevicesOptical PropertiesOxidized Ni/auMaterials ScienceElectrical EngineeringOptoelectronic MaterialsAluminum Gallium NitrideNi/au ContactCategoryiii-v SemiconductorSurface ScienceApplied PhysicsGan Power DeviceThin FilmsAg LayerOptoelectronicsNi/au Bilayer
We report on a high reflectance low resistance multilayer contact to p-GaN composed of a thin oxidized Ni/Au bilayer overcoated with a thick Al or Ag layer and then capped by Ni/Au. Measurements on 500 μm diameter light emitting diode-like test structures show an operating voltage below 4 V at 20 mA that is comparable to identical devices fabricated with a conventional Ni/Au contact. Back surface light emission is about 70% greater than that from devices with the Ni/Au contact due to lower light absorption by the Al or Ag. Performance for both Al and Ag based contacts is stable at temperatures of up to around 100 °C.
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