Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature - Concepedia

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Influence of oxygen in the deposition and annealing atmosphere on the characteristics of ITO thin films prepared by sputtering at room temperature

130

Citations

25

References

2005

Year

C. Guillén, J. Herrero

Materials ScienceMaterials EngineeringRoom TemperatureEngineeringOxide ElectronicsSurface ScienceApplied PhysicsIto Thin FilmsThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing

References

	Year	Citations

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