Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin films - Concepedia

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Top injection reactor tool with in situ spectroscopic ellipsometry for growth and characterization of ALD thin films

24

Citations

17

References

2007

Year

D. Schmidt, Steffen Strehle, Matthias Albert, W. Hentsch, Johann W. Bartha

Microelectronic Engineering

Materials ScienceAluminium NitrideEngineeringSurface ScienceApplied PhysicsAld Thin FilmsThin FilmsChemical DepositionChemical Vapor DepositionSitu Spectroscopic EllipsometryThin Film Processing

References

	Year	Citations

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