Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition - Concepedia

Concepedia

Publication | Open Access

Wide band gap silicon carbon nitride films deposited by electron cyclotron resonance plasma chemical vapor deposition

DOI Full Paper Access

62

Citations

16

References

1999

Year

Kuei‐Hsien Chen, Jih‐Jen Wu, C Y Wen, Li–Chyong Chen, Ching-Feng Fan, P. F. Kuo, Y.F Chen, Yangwei Huang

Thin Solid Films

Materials ScienceEngineeringSurface ScienceApplied PhysicsVacuum DeviceChemical Vapor DepositionPlasma ProcessingThin Film Processing

References

	Year	Citations

Page 1